Atomic Layer Deposition of high-k-dielectric material
A 3 year PhD studentship is available for the development of Atomic Layer Deposition of high-k dielectric materials. High-k dielectrics are important in the next generation of computer processors and memory devices. This project will allow the student to work collaboratively with researchers at Cambridge and Liverpool John Moores University. The PhD project will involve aspects of the growth and characterisation of nanoscale dielectric thin films on germanium based semiconductors. You will join a large and diverse research group working between the Schools of Engineering and Electrical Engineering and Electronics. You should hold a 1st or upper 2nd first degree in Materials, Physics, Chemistry or equivalent.
For further details, please contact Professor P Chalker, email pchalker [at] liv.ac [.] uk
Closing Date: 17 December 2010