Nanotechnology : Nano lithography

BudgetSensors Introduces NEW Calibration Standards

BudgetSensors — Mon, 26 May 2008 09:22:10 +0100

Short description

BudgetSensors® introduces AFM Height Calibration Standards

Article body

Sofia, Bulgaria – 26th May 2008

As a response to the increased demand for affordable high-quality AFM calibration standards, BudgetSensors®, a Bulgarian manufacturer of silicon and silicon nitride probes, as well as AFM accessories for Atomic Force Microscopes (AFM), announces the commercial introduction of 2 different AFM height calibration standards – the HS-100MG and the HS-20MG.

Both height calibration standards feature silicon dioxide structure arrays on a 5x5mm silicon chip. The fabrication process guarantees excellent uniformity of the structures across the chip. This in turn ensures easy and reliable Z-axis calibration of any AFM system.

Arrays of structures with different shape and pitch are integrated on each chip.
Aside from Z-axis calibration, this design also allows X- and Y-axis calibration for bigger scanners (40-100µm range).

The HS-100MG features structures with 100nm and the HS-20MG features structures with 20nm step height.

For more detailed product specifications, please visit BudgetSensors®’ website www.budgetsensors.com/calibration_standards.html.

More calibration standards by BudgetSensors® are under development and will be officially introduced by the company in the second half of 2008.

About BudgetSensors® and Innovative Solutions Bulgaria Ltd.:
BudgetSensors® is a trade mark of Innovative Solutions Bulgaria Ltd.
Established in 2001 and located in the Bulgarian capital Sofia, Innovative Solutions Bulgaria Ltd. offers a variety of products and services within its three divisions AFM Probes, Print & Design and Web & Programming.

The AFM Probe division manufactures and sells probes and accessories for Atomic Force Microscopes under the trade name of BudgetSensors® used by the most advanced R&D institutions worldwide. The Atomic Force Microscope (AFM) is one of the most important instruments for the Nanotechnology industry and research.

The Print & Design and Web & Programming divisions offer solutions for corporate design, presentation and promotion materials.

Source information

Innovative Solutions Bulgaria Ltd.
48, Joliot Curie St
Sofia 1113
Bulgaria
Tel: +359 (2) 963 09 41
sales@budgetsensors.com

www.isb.bg
www.budgetsensors.com

Source title

BudgetSensors

Source Url

www.budgetsensors.com

SEMTech Solutions and Interface, Ltd. Sign Agreement to Distribute the NanoMaker EBL System in North America

gbrake — Mon, 19 May 2008 20:29:48 +0100

Short description

NanoMaker is a powerful hardware and software add-on system enabling SEMs or FIBs to create 2D and 3D nanostructures by lithographic means.

Article body

Billerica, MA; May 19, 2008 – SEMTech Solutions is pleased to announce the signing of an agreement with Interface, Ltd., a scientific software company based in Moscow, Russia, to distribute the NanoMaker SEM/FIB EBL conversion system in North America. Under the terms of the agreement, SEMTech Solutions will offer limited trial versions of the NanoMaker system to interested parties.

The NanoMaker software solves a range of problems associated with proximity effects in 2D and 3D nanostructures. Also, the proprietary software features predictive EBL results through simulation, and a hierarchical multilayer graphical editor. The NanoMaker software is available for upgrades to existing EBL add-on systems. The NanoMaker hardware corrects for SEM deflection distortion problems, offers the capability to expose without a beam blanker, provides seamless field stitching and alignment, and is compatible with the most popular SEMs or FIBs. The NanoMaker software and hardware features are offered separately, or as a complete package.

“We were impressed with the NanoMaker’s capability to optimize a 10 nm nanostructure with known proximity effects, as well as feedback provided by users of the product in Europe,” said Gerry O’Loughlin, President of SEMTech Solutions. “In addition, we plan to have the complete NanoMaker system available for demonstration on one of our FE-SEMs at our facility in Billerica, MA. We are confident that both companies working together will provide the end user with an excellent technical product that is well supported.”

Visit the SEMTech Solutions Web site to learn more about the NanoMaker at http://www.semtechsolutions.com

About SEMTech Solutions: SEMTech Solutions is a leading supplier of refurbished SEMs and analytical FE-SEM services. In addition, we are also a North American sales and service representation company handling new scientific instrumentation that specializes in electron beam technology. With over 200 years combined SEM experience, our sales and service engineers located throughout the U.S. are committed to our customers. Our growing customer install base ranges from universities to start-ups to Fortune 100 companies.

About Interface: Interface was founded in 1990 and is a flexible innovative company with close ties to the Russian Academy of Sciences. Our scientific background and constant collaboration with Russian research institutes gives us access to innovative technologies and highly skilled employees. Our software development process is based on market-leading technologies. Interface is a Microsoft Certified Partner and is affiliated with the National Software Development Association (NSDA), the Association for System Integration and Information Control Systems Development (SIRIUS), and the Association of Enterprises of Computer and Information Technologies (AECIT).

###

Source information

Gary Brake, Marketing Manager
gbrake@semtechsolutions.com SEMTech Solutions, Inc.
978-663-9822

Source title

Source Url

http://www.semtechsolutions.com

NanoBio Chemicals India Private Limited

drajitzambre — Fri, 09 May 2008 06:44:04 +0100

Ticker Id

Web url

www.nanobiochemicals.com

Contact Email

ajitzambre@gmail.com

Short description

Street address

#217/7, 1st Cross, Ganesh Marg, Hindwadi, Belgaum. Karnataka, INDIA

Zip or postal code

590011

Telephone

+91 831 246 6522

Fax

+91 831 246 6522

Foundation date

Ceo, president

Dr. Kattesh Katti

Number of employees

Long description

We deals with variety of water soluble biocompatible metallic nanomaterials such as nanoparticles, nanorods, nanotriangles, nanohexagons, nanocrystals, etc.
The naomaterials and nanoconstructs are available for gold, silver, palladium, platinum and iron in aqueous base.
These nanomaterials have wide spectrum utility for nanoscience and nanotechnology researchers in academia and industry.
The major applications can be exploited in disease diagnosis, therapeutic effectiveness, Novel drug delivery formulations and also in areas other than biomedical field.
Biocompatibly coated gold and silver nanoparticles allow systematic variations in metal content, thus providing unprecedented means of developing mono or multi nanolayers with assorted metal content for variety of materials and biomedical research applications.
Aggregation of gold and silver nanoparticles in ionic media is a common phenomenon, thereby impeding researchers from carrying out important experiments in ionic fluids.
The technology allows retention of nanoparticulate properties of gold and silver even in the presence of high concentrations of ions. The new dispersible solution phase nanoconstructs allow customers to directly utilize gold and silver nanoparticles in solution phase for such research and product development applications that involve spraying, spin coating, emulsification, mixing, and implanting processes.
Gold nanoconstructs allows researchers to use “one-step” direct labeling of biocompatible gold nanoparticles with target specific proteins/peptides and various markers.
Silver nanomaterials has potential anitmicrobial, anti-fungal, anti-viral, germicidal, etc. applications in health, hygeine, packaging and environmental restoration domains.
Palladium and platinum nanoparticles are unique resources for catalytic testing and manufacture of specialty fine chemicals and pharmaceutical intermediates.

Additional Commentaries and remarks

Patents

VR Matching® a new concept in semiconductor process Control

tzavecz — Tue, 22 Apr 2008 13:48:00 +0100

Short description

TEA Systems announced the release of an unprecedented product that simplifies the most complex tasks in semiconductor process control. VR Matching® provides a simple solution to a complex task by overcoming, the need for many involved analysis techniques along with the obstacles and pitfalls of comparative response studies in semiconductor production.

Article body

VR Matching®
TEA Systems Announces the release of a new product for
Process & Tool matching
for sub-65 nm node lithography

Allentown, PA (USA). May 1, 2008 -- TEA Systems announced the release of an unprecedented product that simplifies the most complex tasks in semiconductor process control. VR Matching® provides a simple solution to a complex task by overcoming, the need for many involved analysis techniques along with the obstacles and pitfalls of comparative response studies in semiconductor production.

Many of the core tasks in yield optimization and process control center on the skill and experience of the engineer in handling large amounts of complex data. Process yields key directly on the quality of each engineer’s methodic approach to a solution for each unique problem and often their ability to custom code a general purpose interface such as MathCAD*. With this approach the complexity of each solution rises as it attempts to evolve along with the process and product spectrum of production. In focusing on a single-task solution, the common element in these problems is neglected along with the simplicity of the method. Simplicity is derived from the fact that most process control tasks are based on a comparative analysis of performance and nothing more.

Terrence Zavecz, president of TEA Systems stated:

"The classic example for a comparative analysis need is found in tool matching but many of the greatest process challenges are not even regarded as a comparative analysis. For example the evaluation of ARC or other process film responses, reticle qualification, reticle haze and lens contamination.

Most process control solutions have become overly complex. Process Window models are a good example of evolved over-complexity. Here, along with complexity comes a concurrent loss in the model’s ability to adapt to the subtle nuances and variations now encountered in the sub-65 nm nodes and double-patterning approach. VR Matching provides a powerful, sophisticated but user-simplified and highly automated solution to these and many other comparative analysis tasks."

VR Matching applications include:

• Tool matching for overlay, registration, double-patterning, focus, etch, CVD, CMP, Electrical Response, Proximity
• Critical Dimension (CD) and feature profile uniformity analyses across slit, scan, wafer and lot.
• Reticle haze and Lens Contamination
• Process Window response matching, centering, optimization and extrapolation without the use of complex polynomial models.
• Process Correction validation and Split-lot performance.
• Reticle Effect removal.
• OPC, proximity correction and depth-of-focus response.

VR Matching supports both Comparative and Difference Matching techniques. The product works seamlessly with other TEA Systems products and calculated difference data can be modeled using Weir PW or the user-customized models of Vector Raptor.

VR Matching uses TEA Standard Data Format workbooks for storage of all data and reports. TEA Systems products provide tools to easily import any format metrology data into the standard format workbooks. There is never a charge for new-format updates. Our products include full support for ASML registration, overlay and FOCAL metrology. Fixed or floating-node licenses are available.

Availability

VR Matching is available May 1, 2008.

VR Matching and Weir PW products run on windows-based computers using Windows XP, Windows 2000, Small Business Server 2003 etc. Pricing starts at a competitive $12,000 USD per seat.

For more information or to order VR Matching, contact TEAsales@TEAsystems.com.

About TEA Systems

TEA Systems, a privately held corporation since 1988, specializes in advanced, intelligent and adaptive process modeling of the photomask, semiconductor process and it's toolsets. Products from TEA allow the user to decouple process, tool and random perturbations to enhance process setup, control and yield.

TEA Systems products include:

Vector Raptor: Advanced overlay process control for Double Patterning, simulation and feature design optimization.

Weir PSFM: Full-wafer/field/scan analysis tool for FOCUS derived from proprietary defocus sensitive features.

Weir PW: Reticle/Full-wafer/field/scan/process data modeling for any metrology with advanced process window capabilities. Product is capable of addressing both wafer and photomask process control.

Weir DMA: Macro Automation interface for Weir PSFM and Weir PW for external calling, automated data gathering or one-button analysis of commonly used sequences. Includes data trending.

Weir TR: A tool to link and correlate profile, film and critical element control to temporal or thermal reactions such as PEB and Chill Plate.

See us at http://www.TEAsystems.com for a free demonstration or evaluation.

News and Information: http://www.TEAsystems.com/NewsReleases.htm

Contact: Sales@TEAsystems.com or
Terrence Zavecz
Phone: +1 610 682 4146
Cell: +1 610 462 0706

* FOCAL is a product of ASM Lithography
* MathCAD is a product of PTC (http://www.ptc.com/)

KeyWords:

Reticle, Reticle Haze, Validation, Lens Contamination, Lens Heating, OPC, RET, Difference, Match, Matching, Comparison, Comparative, Metrology, Model, Interpolate, Process Window, Process Control, Optimization

Source information

Terrence E. Zavecz
tzavecz@TEAsystems.com
+1 610 682 4146

Source title

Source Url

http://www.teasystems.com/News/VR_Match_News.htm

MIGAS'08 - International Summer School on Advanced Microelectronics

larrynano01 — Mon, 14 Apr 2008 11:21:29 +0100

Short description

This 11th session of MIGAS is devoted to: "Nanoscale CMOS and Si-based Beyond CMOS Nanodevices"

This school is addressed to PhD students, engineers and researchers coming both from the university and from industry of the semiconductors.

Long description

Program:
1) Advanced materials, technology and characterization methods for nanoscale CMOS
- Strained SOI materials for high performance MOSFETs, C. MazurÃ�Â©, SOITEC
- Advanced strain platforms, E. Parker, Warwick University
- High k dielectrics and metal gates, O. Engstrom, Chalmers University
- Schottky source-drain contacts, E. Dubois, IEMN
- Emerging nanotechnologies, T. Baron, LTM
- New characterization methods for nanoMOSFETs, G. Ghibaudo, IMEP-LAHC

2) Novel CMOS architectures
- Multi-gate and multi-channel MOSFETs, T. Ernst , Leti
- Silicon-On-Nothing nanodevices, T. Skotnicki, STMicroelectronics
- Ge channel MOSFETs, G. Eneman, IMEC
- III-V channel MOS transistors, A. Dimoulas, Demokritos

3) Beyond-CMOS Nanodevices
- Small slope Switches, A. Ionescu, EPFL
- Nanowires, J.P. Raskin, UCL
- Carbon electronics, J. Xu, Brown University

4) Innovative Memories
- Non-volatile memories, L. Baldi, STMicroelectronics
- Advanced DRAM, M. Golbach, Qimonda
- Emerging memories, H.-S. Ph. Wong, Stanford University

Event precise location and contact information

Location: Grenoble / Autrans, France
Contact: Laurent.Montes@minatec.inpg.fr

Web site Url link

http://www.migas.inpg.fr

Web site Url text

www.migas.inpg.fr

BudgetSensors Introduces DLC Coated AFM Probes

BudgetSensors — Tue, 08 Apr 2008 12:19:54 +0100

Short description

BudgetSensors® offers a selection of Diamond-Like-Carbon coated (DLC) AFM probes.

Article body

Sofia, Bulgaria – 8th April 2008

BudgetSensors®, a Bulgarian manufacturer of silicon and silicon nitride probes, as well as AFM accessories for Atomic Force Microscopes (AFM), announces the introduction of a range of Diamond-Like-Carbon (DLC) coated AFM probes.

All basic types of BudgetSensors’ silicon AFM probes (Standard tapping mode, Tapping mode with long cantilever, Soft tapping mode, Force modulation mode and Contact mode) are now available with a DLC coating on the tip side of the cantilever.

The hard DLC coating offers high durability and decreased tip wear, hereby increasing tip life. At the same time, because of the excellent properties of this coating, the effect on tip is only minimal: the tip radius of all DLC coated AFM probes is better than 15nm.
The DLC coating is not electrically conductive.

All DLC coated AFM probes are being offered with an aluminium reflex coating on the back side of the cantilever and with alignment grooves on the holder chip.

Hereby, BudgetSensors range of products is being extended by the following Order Codes:

Tap300DLC – Standard tapping mode AFM probe with DLC coating
Tap190DLC - Tapping mode AFM probe with long cantilever, with DLC coating
Tap150DLC – Soft tapping mode AFM probe with DLC coating
Multi75DLC – Force modulation mode AFM probe with DLC coating
ContDLC – Contact mode AFM probe with DLC coating

BudgetSensors is working on more product introductions, which will follow until the end of this year.

More information on these and other BudgetSensors® products can be found here: www.budgetsensors.com.

The Print & Design and Web & Programming divisions offer solutions for corporate design, presentation and promotion materials.

www.isb.bg
www.budgetsensors.com

Source information

Innovative Solutions Bulgaria Ltd.
48, Joliot Curie St
Sofia 1113
Bulgaria
Tel: +359 (2) 963 09 41
sales@budgetsensors.com

Source title

Source Url

NanoBeam Limited

nanobeam — Wed, 02 Apr 2008 11:20:49 +0100

Ticker Id

Web url

http://www.nanobeam.co.uk

Contact Email

info@nanobeam.co.uk

Short description

Street address

College Business Park, Cambridge

Zip or postal code

CB1 3HD

Telephone

+44 (0)1223 243925

Fax

+44 (0)1223 243924

Foundation date

Ceo, president

Dr Tao Zhang

Number of employees

Long description

NanoBeam, founded in 2002, has developed breakthrough technology to produce high performance and cost effective electron beam lithography tools. Our innovative designs significantly reduce product cost and therefore the ownership cost without compromising on accuracy or automation.

Small machine size, excellent resistance to stray field, advanced vibration tracking, and low power dissipation result in low cleanroom requirements.

Outstanding mechanical rigidity and fast stage and beam deflection settling result in higher throughput in mix-and-match and direct write. The modern architecture requires fewer mechanical and electronic system components, which simplifies service and makes our products very reliable.

Additional Commentaries and remarks

Patents

Clearing the US and EU Regulatory Path to Product Approval – “What Similarities and Differences Exist and How Can Companies Mana

aneeshasks — Mon, 24 Mar 2008 19:46:42 +0000

Short description

Clearing the US and EU Regulatory Path to Product Approval – “What Similarities and Differences Exist and How Can Companies Manage the Hurdles?”

Learn how to navigate through the complexities and policy changes that biotech and nanotech products face today. Expert advice and case studies will provide valuable lessons on how policy and regulation is influencing technology in the US and EU and what companies can do to save time and cost throughout the process. Do regulatory agencies have the legal authority to make judgments on nanomaterials? Are they ready for this responsibility?

Long description

Clearing the US and EU Regulatory Path to Product Approval – “What Similarities and Differences Exist and How Can Companies Manage the Hurdles?”

Featured Speakers:

Kjell Srandberg, M.D., Ph.D.
Advisory Board Chairman NDA,
Regulatory Consultant Service AB,
Former Director General of the Swedish Medical Products Agency & member of CPMP

Ricardo Carvajal,
Esq. Of Counsel, Hyman, Phelps & McNamara, P.C.,
former – FDA Counsel

Moderator: Michael A. Swit, Esq.
Vice President, The Weinberg Group

Place: Morrison & Foerster, 12531 High Bluff Drive, Suite 100, San Diego, California 92130

Date: Thursday, April 10, 2008

Time: 5:30 pm - 8:30 pm
5:30pm Reception and networking
6:30pm Program begins

Event precise location and contact information

Place: Morrison & Foerster, 12531 High Bluff Drive, Suite 100, San Diego, California 92130

Web site Url link

www.nanobionexus.org

Web site Url text

Sigma-Aldrich Corporation

dgaige — Tue, 26 Feb 2008 15:37:53 +0000

Ticker Id

Web url

http://www2.sigmaaldrich.com/suite7/Area_of_Interest/Chemistry/Materials_Science/Nanotechnology/Nanotech_Intro.html?cm_mmc=NanoVIP-_-affiliate-_-link-_-link

Contact Email

ContactSigma-Aldrich@sial.com

Short description

Street address

3050 Spruce Street

Zip or postal code

63103

Telephone

(800) 521-8956

Fax

(800) 325-5052

Foundation date

Ceo, president

Jai Nagarkatti

Number of employees

Long description

Sigma-Aldrich is a leading Life Science and High Technology company. Our biochemical and organic chemical products and kits are used in scientific and genomic research, biotechnology, pharmaceutical development, the diagnosis of disease and as key components in pharmaceutical and other high technology manufacturing. We have customers in life science companies, university and government institutions, hospitals and in industry. Sigma-Aldrich operates in 36 countries and has over 7,600 employees providing excellent service worldwide.

Additional Commentaries and remarks

Patents

Metamaterials’2008 2nd International Congress on Advanced Electromagnetic Materials in Microwaves and Optics

podlozny — Tue, 26 Feb 2008 12:46:54 +0000

Short description

Metamaterials’2008

2nd International Congress on Advanced Electromagnetic Materials in Microwaves and Optics
Pamplona, Spain , September 21-26, 2008

The Congress is organized by the Virtual Institute for Artificial Electromagnetic Materials and Metamaterials - METAMORPHOSE VI AISBL and encompasses a Conference and European Doctoral School. The conference aims to address a wide area of research related to metamaterials, artificial electromagnetic materials and surfaces in the microwave and optical ranges, encompassing general theory, design, applications, fabrication and measurements.

Long description

The Congress aims to address a wide area of reseach related to metamaterials, artificial electromagnetic materials and surfaces in the microvawe and optical ranges, encompassing general theory, design, applications, fabrication and measurements. The conference topics include but are not limited to:

* Artificial electromagnetic materials and surfaces
* Plasmonic metamaterials
* Spatially dispersive materials
* Negative index materials
* Chiraland bianisotropic media
* Artificial and composite magnetic materials
* Electromagnetic bandgap structures and photonic crystals
* Nonlinear metamaterials and artificial surfaces, ultrafast phenomena and devices
* Tunable and active metamaterials and surfaces
* Nano-scaled metamaterials
* Periodic structures, frequency selective surfaces, nano-structured surfaces, enhanced transmission
* New physical phenomena in complex media
* Effective medium modelling and materialphenomenology
* Modelling of complex materials and surfaces
* Fabrication and processing of metamaterials and artificial electromagnetic surfaces
* Experimental characterization of metamaterials and measurement techniques
* Electromagnetic waves in complex media: propagation, reflection, diffraction and scattering
* Guiding structures with complex media, including nano-scaled transmission lines
* Complex materials in microwave and optical
* Miniaturisation of microwave and optical devices
* Metamaterial based antennas
* Subwavelength imaging, enhancement of evanescent fields, including nano-imaging and detection
* Plasmon-polariton devices and circuits
* Emerging metamaterial technologies
* Educational aspects of metamaterials

Event precise location and contact information

Baluarte, Palacio de Congresos y Auditorio de Pamplona
Plaza del Baluarte. 31002 Pamplona
Tel: 948 066 066
Fax: 948 066 077
WWW: http://www.baluarte.com
http://congress2008.metamorphose-vi.org/

Web site Url link

http://congress2008.metamorphose-vi.org/

Web site Url text

Metamaterials’2008

Newcastle University: Nanoscale Science & Nanotechnology Research Group

dutton — Sun, 20 Jan 2008 10:01:36 +0000

Ticker Id

Web url

http://research.ncl.ac.uk/nanoscale/index.html

Contact Email

Short description

Street address

University of Newcastle upon Tyne

Zip or postal code

NE1 7RU

Telephone

Fax

Foundation date

Ceo, president

Number of employees

Long description

The Nanoscale Science & Nanotechnology Group is a world-leading research group based in the School of Chemical Engineering & Advanced Materials at Newcastle University UK. Research activities encompass a wide range of themes at the cutting-edge of nanoscale science and nanotechnology - principal interests lie in the synthesis and characterisation of new nanomaterials, such as nanodiamonds, silicon nanocrystals, gold nitride (AuN) and photon reactions on ice.

Our work is multidisciplinary and highly collaborative, drawing on expertise from across physics, chemistry, medicine, and materials science. We have strong links with other leading laboratories and research facilities throughout the world.

Additional Commentaries and remarks

Patents

MIGAS'08 - 11th International Summer School on Microelectronics

lm_nano — Tue, 08 Jan 2008 21:50:08 +0000

Short description

MIGAS '08 - 11th session
Nanoscale CMOS and Si-based Beyond CMOS Nanodevices

Long description

This school is addressed to PhD students, engineers and researchers coming both from the university and from industry of the semiconductors. Through a program based on lessons given by the best international scientists, the participants will be able to improve their knowledge on state of the art and future nanodevices.

Event precise location and contact information

Laurent.Montes@minatec.inpg.fr
AUTRANS-GRENOBLE, France

Web site Url link

http://www.migas.inpg.fr

Web site Url text

Institute of Microelectronics, Electromagnetism and Photonics - IMEP

lm_nano — Tue, 08 Jan 2008 21:42:55 +0000

Ticker Id

Web url

http://www.imep.enserg.fr

Contact Email

laurent.montes@minatec.inpg.fr

Short description

Street address

Minatec, 3 Parvis Louis Neel - Grenoble, France

Zip or postal code

38016

Telephone

+33 456 529 527

Fax

Foundation date

Ceo, president

Number of employees

Long description

Additional Commentaries and remarks

Patents

ASML, Zeiss and Canon Cross-License Lithography Equipment Patent Portfolios

JohnT — Sat, 22 Dec 2007 16:03:10 +0000

Short description

ASML Holding NV (ASML) and Carl Zeiss SMT (Zeiss) today announce that each has signed an agreement with Canon Inc.

Article body

ASML Holding NV (ASML) and Carl Zeiss SMT (Zeiss) today announce that each has signed an agreement with Canon Inc. (Canon) for the global cross-license of patents in their respective fields of semiconductor lithography and optical components, used to manufacture integrated circuits, or chips.

ASML and Zeiss with their large current research and development efforts and resulting know how, welcome this agreement with Canon, with its substantial patent portfolio. There will be no transfer of technology, which means ASML and Zeiss will continue to compete with all players in the market on the basis of their capability to bring leading technologies to market.

The cross-license helps the three companies to compete more freely in the area relevant to their customers, which is technology expertise and implementation, rather than on intellectual property (IP) rights. ASML and Zeiss are strongly committed to investing in research and development and will continue their build-up of know how and IP.

The agreement means that the companies can market products based on technology covered by the other party’s lithography equipment-related patents.

About Semiconductor Lithography

Semiconductor lithography is the process in which a substrate on a silicon wafer is exposed through a mask through optical or particle projection. ASML machines use this photographic process to image electronic circuit patterns onto silicon wafers, much like a camera prints an image on film. Lithography machines are critical to the production of integrated circuits or chips, and the main driver of the continuing miniaturization of electronic features on semiconductors.

About ASML

ASML is the world's leading provider of lithography systems for the semiconductor industry. Headquartered in Veldhoven, the Netherlands, ASML is traded on Euronext Amsterdam and NASDAQ under the symbol ASML. ASML has more than 6,400 employees, serving chip manufacturers in more than 60 locations in 15 countries. For more information, visit the web site: www.asml.com

About Carl Zeiss SMT AG:

With a wide-ranging product portfolio, Carl Zeiss SMT meets the requirements of the key processes involved in nanotechnology and microchip production, making it one of the leading direct and indirect suppliers to the semiconductor industry. As an innovation leader in the field of Lithography Optics and optical and electron beam-based inspection and measuring systems, Carl Zeiss SMT generates important momentum for further development in the chip industry and nanotechnology. Together with its subsidiaries at locations in Germany, UK, USA and France, the international group of companies employs a total workforce of some 1,900 people. For the latest fiscal year ending September 30, 2006, the company recorded Net Sales of EUR >860 Million. The stock corporation is a 100% subsidiary of Carl Zeiss AG.

Forward Looking Statements

"Safe Harbor" Statement under the US Private Securities Litigation Reform Act of 1995: the matters discussed in this document may include forward-looking statements that are subject to risks and uncertainties including, but not limited to: economic conditions, product demand and semiconductor equipment industry capacity, worldwide demand and manufacturing capacity utilization for semiconductors (the principal product of our customer base), competitive products and pricing, manufacturing efficiencies, new product development, ability to enforce patents, the outcome of intellectual property litigation, availability of raw materials and critical manufacturing equipment, trade environment, and other risks indicated in the risk factors included in ASML’s Annual Report on Form 20-F and other filings with the US Securities and Exchange Commission.

Source information

ASML Holding NV
Media Relations:
Lucas van Grinsven, +31 40 268 3949
Corporate Communications
Veldhoven, NL
or
Investor Relations:
Craig DeYoung, +1 480 383 4005
Tempe, Arizona, USA
or
Franki D’Hoore, +31 40 268 6494
Veldhoven, NL
or
Zeiss
Media Relations
Dagmar Ewert, + 49 73 64 20 2194
Marketing Communications
Oberkochen – Germany

Source title

Source Url

www.smt.zeiss.com

Brion Technologies

JohnT — Wed, 19 Dec 2007 17:16:58 +0000

Ticker Id

Web url

http://www.brion.com

Contact Email

cdesplat@brion.com

Short description

Street address

4211 Burton Drive

Zip or postal code

95054

Telephone

(408) 653-4306

Fax

Foundation date

Ceo, president

Number of employees

Long description

Brion Technologies is the worldwide leader in computational lithography for integrated circuit Lithography-Driven Design and Manufacturing™. Brion's Tachyon™ platform, a highly accurate and ultra-fast OPC and OPC verification system, enables a unique set of capabilities that address the interrelated challenges of design, photomask making and wafer printing for semiconductor manufacturing.

Headquartered in Santa Clara, CA, Brion leads the worldwide market for OPC verification, and is rapidly expanding in the OPC market.

Worldwide, Brion is growing. If you want to be part of a winning team

Additional Commentaries and remarks

Patents

NanoAndMore USA (East Coast)

Fri, 30 Nov 2007 07:59:09 +0000

Ticker Id

Web url

http://www.nanoandmore.com/usa/

Contact Email

usa@nanoandmore.com

Short description

Street address

9 James F. Byrnes Street

Zip or postal code

SC 29907

Telephone

+1 843 5211108

Fax

+1 843 521 1148

Foundation date

Ceo, president

George McMurtry

Number of employees

Long description

NanoAndMore is a leading supplier of various kinds of equipment and consumables for nanotechnology research, including AFM Probes, Optical Microscopy Equipment, Particle Size Analysis Equipment, AFM Imaging Software and Vibration Isolation Equipment. European distributor of SPM/AFM Equipment and consumables. Distributor of SPM and AFM tips, probes, cantilevers, calibration standards, supplies for atomic force microscopy and scanning probe microscopy and equipment for nanotechnology research.

Additional Commentaries and remarks

Patents

ePIXnet Nanostructuring Platform for Photonic Integration

Tue, 06 Nov 2007 09:39:12 +0000

Ticker Id

Web url

http://www.nanophotonics.eu/

Contact Email

jww1@st-and.ac.uk

Short description

Street address

North Haugh, St Andrews, Fife, Scotland.

Zip or postal code

KY16 9SS

Telephone

00441334463439

Fax

00441334463104

Foundation date

Ceo, president

William Whelan-Curtin

Number of employees

Long description

The Nanostructuring Platform is a platform in the EU funded Framework 6 ePIXnet Network of Excellence. Our role is to facilitate research projects by providing access to expensive and complicated Nanofabrication facilities. The platform is made up of a number of partners from across the EU. Each partner provides one or more important capability with the end result being a well equipped Nanophotonics foundry.

With the assistance of this platform, it therefore becomes possible for groups without fabrication facilities to have access to nanophotonic devices, such as photonic crystals and photonic wires, of the highest quality with minimal difficulty. This approach is especially important, as over recent years, the complexity and cost of the necessary machines has increased dramatically as the precision required to create world class devices has increased.

Through the ePIXnet project, we are collaborating in a number of ePIXnet funded research activities, however, non-ePIXnet institutions may also access this platform. In fact, as it is intended that this platform should continue after the ePIXnet project, these external users are very important. This website contains descriptions of specific processes that this platform can perform, along with the best and typical performance that may be expected. This information can be used to determine the types of device that may be made for ePIXnet and non-ePIXnet users.

At a later stage, certain performance guarantees will be made for benchmark devices (currently only available on one device type). Test structures may then be included which the user may test and then notify us should the devices not be up to the specifications.

ePIXnet is also running a number of other platforms that are complementary to this platform Silicon Photonics, InP Photonics (JEPPIX), Modelling, High Speed Characterisation and Packaging. More details can be found at www.ePIXnet.org.

Currently ePIXnet is providing a substantial fraction of the running costs for this platform, typically, requiring users only to cover consumables for devices fabricated while including the relevant Nanostructuring Platform people as co-authors on any resulting publications. The exact contribution to be required from the user will be determined through negotiation with the specific partners involved on a case-by-case basis.

However, ePIXnet comes to a close in the Autumn of 2008, and if this platform is continue running costs will have to come from elsewhere. To this end, we would be hopeful that potential users will request funding in future project applications for the provision of devices by this platform. For our part, we will endeavour to provide devices of the highest quality thus enabling world class research work.

This activity will be non profit- the money provided will go towards running costs and the provision of technical staff at the partner institutions as well as capital investment in state-of-the-art equipment. Additionally, fabrication advances made by any of the partners can be made available to the community.

A number of the current ePIXnet activities are researching improved device functionalities. It is envisaged that the successful realisation of these projects will lead to a new generation of devices being offered through the platform- for example, active InP and Silicon devices (those currently available are passive). Furthermore, any additional advances made at any of the partner institutions may also be incorporated into the platform (if suitable), thus leading to benefits to both the researchers concerned and the Nanophotonics community, in general.

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Patents

BudgetSensors Introduces Another NEW Tapping Mode AFM probe and Alignment Grooves for a Selection of AFM Probes

BudgetSensors — Thu, 01 Nov 2007 10:43:11 +0000

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BudgetSensors®, a division of Innovative Solutions Bulgaria Ltd., introduces new tapping mode AFM probes, as well as a new feature for a selection of AFM probes.

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Sofia, Bulgaria – 1st November 2007

BudgetSensors®, a Bulgarian manufacturer of silicon and silicon nitride probes, as well as AFM accessories for Atomic Force Microscopes (AFM), announces the introduction of a new tapping mode AFM probe, as well as a new feature for a selection of AFM probes.

Following the introduction of BudgetSensors®’ Soft Tapping Mode AFM Probes Tap150-G and Tap150Al-G, the company now announces the introduction of another type of Tapping Mode AFM probe – the Tap190-G. In addition to a resonance frequency of about 190 kHz, Tap190-G AFM probes are characterized by a long cantilever, compared to Tap300 and Tap150-G AFM probes, which is required for some specific models of AFM systems by certain manufacturers, such as Quesant.

At the same time, BudgetSensors announces that it now offers a selection of AFM probes featuring alignment grooves on the back side of the holder chip, which is indicated by the index “-G” in the product order code. Alignment grooves are a necessary requirement for the mounting of AFM probes into some specific AFM systems, such as NanoSurf. In AFM systems where alignment grooves are not necessary, this feature doesn’t affect the mounting of the AFM probe in any way.

The current product range of AFM probes with alignment grooves on the holder chip features:
• Tap150-G soft tapping mode AFM probes
• Tap150Al-G soft tapping mode AFM probes with Al coating
• Tap190-G tapping mode AFM probes with long cantilever
• Tap190Al-G tapping mode AFM probes with long cantilever and Al coating
• Multi75Al-G force modulation AFM probes with Al coating
• ContAl-G contact mode AFM probes with Al coating
• Multi75E-G electrical force modulation AFM probes
• Multi75M-G magnetic AFM probes

More product types with alignment grooves will be released soon.

With or without alignment grooves, .the prices of all comparable product types remain the same.

BudgetSensors is working on more product introductions, which will follow until the end of this year.

The Print & Design and Web & Programming divisions offer solutions for corporate design, presentation and promotion materials.

Source information

Innovative Solutions Bulgaria Ltd.
48, Joliot Curie St
Sofia 1113
Bulgaria
Tel: +359 (2) 963 09 41
sales@budgetsensors.com

www.isb.bg
www.budgetsensors.com

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PI ( Physik Instrumente ) L.P. (US office)

Fri, 31 Aug 2007 14:01:26 +0100

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http://www.pi-usa.us/

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info@pi-usa.us

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16 Albert St.

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01501

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508 832 3456

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508 832 0506

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Ceo, president

Brian Lula

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PI is a world leading, ISO 9001 certified OEM & Research Supplier of Piezoelectric Nanopositioning Systems and Motorized Micropositioning Systems (Mechanics, Controllers & Software). Applications in the following industries: Semiconductors, Data Storage, Photonics, Fiber Optics, Life Sciences, Lasers, Optics, Microscopy, Aerospace Engineering, Precision Machining, Astronomy

Products: Piezoelectric Actuators, NanoPositioning & NanoAutomation Systems, Hexapod 6D-MicroRobots, Photonics Alignment Systems, Capacitive Position Sensors, PZT Ceramics, Piezo Motors, Active Steering Mirrors, Digital & Analog Motion Controllers, Piezo Drivers, Amplifiers, Controllers, MicroPositioning Equipment such as Translation & Rotation Stages, Actuators, Precision Motor Controllers, Fiber Aligners.

PI (Physik Instrumente) L.P. is the leading manufacturer of piezoelectric stages for ultra-high precision positioning and motion control applications. Over more than 30 years leading-edge products were developed for many high tech applications in biotech, high resolution microscopy (Z-stack scanners for high-speed 3D image acquisition) nano-metrology (semiconductors) and for the photonics industry.
High-bandwidth nanoprecision sensors are integrated in closed loop XY, XYZ or Z-positioning stages. Parallel-Kinematic designs provide symmetric response for all motion axes. Ceramic encapsulated piezo actuators provide higher life time and eliminate outgassing.

With more than 400 employees worldwide, metrology & service labs on 3 continents, ISO 9001 quality, and the most experienced design and manufacturing teams for nanopositioning equipment, PI can provide you with the optimum standard and custom solution for your nanopositioning task.

Nanotechnology : Nano lithography

BudgetSensors Introduces NEW Calibration Standards

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SEMTech Solutions and Interface, Ltd. Sign Agreement to Distribute the NanoMaker EBL System in North America

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NanoBio Chemicals India Private Limited

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VR Matching® a new concept in semiconductor process Control

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MIGAS'08 - International Summer School on Advanced Microelectronics

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BudgetSensors Introduces DLC Coated AFM Probes

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Clearing the US and EU Regulatory Path to Product Approval – “What Similarities and Differences Exist and How Can Companies Mana

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Sigma-Aldrich Corporation

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