Nanotechnology : Taipei

SPIE Lithography Asia 2008 - Taiwan

Admin — Fri, 19 Sep 2008 12:21:38 +0000

Short description

It is our great pleasure to invite you to attend the first SPIE Lithography Asia conference, featuring presentations from leading researchers, developers, and innovators.

Long description

Synopsis / Description:
It is our great pleasure to invite you to attend the first SPIE Lithography Asia conference, featuring presentations from leading researchers, developers, and innovators. This is your opportunity to hear the latest research and connect with others working at the leading edge of semiconductor device technologies.
Conference topics will include:
Emerging Lithographic Technology and Nanofabrication
• Optical lithography extension (shorter than 157 nm)
• EUV lithography
• E- and ion- beam technology
• Nano-imprint lithography
• Application on nanostructures
Optical Microlithography
• ArF immersion lithography
• RET technology
• Double exposure/double patterning lithography
• OPC modeling
• Photo cluster automation
Advances in Resist Material and Processing
• Emerging resist materials
• Advancement in immersion resists
• Resist process optimizations
• Resist material for LCD application
• Double exposure material
Metrology, Inspection, and Process Control
• Advancement in CD metrology
• Advancement in overlay metrology
• Advancement in defect inspection
• Process control for CD and overlay

Event precise location and contact information

Sheraton Taipei Hotel
Taipei, Taiwan

4-6 november 2008

http://spie.org/lithography-asia.xml?WT.mc_id=RCALENDARW

Web site Url link

Web URL: http://spie.org/lithography-asia.xml?WT.mc_id=RCALENDARW

Web site Url text

National Science and Technology Program for Nanoscience and Nanotechnology

Benj — Mon, 05 Mar 2007 12:22:14 +0000

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Web url

http://nano-taiwan.sinica.edu.tw/

Contact Email

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Street address

Institute of Physics, Academia Sinica, 128 Sec. 2, Academia Rd

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11592

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Ceo, president

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The goals include:

1. Through the establishment of common core facilities and education programs to achieve academic excellence, and promote industrial applications.
2. Based on the national competitive technologies to bring up the academic excellence, and then create innovative industrial applications.
3. Establish international competitive nanotechnology platforms.
4. Enhance advanced innovative research to speed up the commercialization of nanotechnology.

Additional Commentaries and remarks

Patents

TECO Nanotech Co. Ltd

Benj — Thu, 14 Dec 2006 15:10:42 +0000

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Web url

http://wwwe.teconano.com.tw/

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Street address

6F, No. 156-1, Sungchiang Road

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Ceo, president

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The predecessor of TECO Nanotech Co., Ltd. is Teco Information Co., Ltd. which was founded in 1989 and supplying color monitor for domestic and overseas markets. In 1997, TECO Electric & Machinery, UMC Group, KGI Group and NEC of Japan raised funds together to establish TECO Information, CRT plant for the production of 17 inches Flat and Multimedia High Illumination Cathode Ray Tube.

　In order to meet with the business opportunity of nano-tech products, TECO Information has been renamed, in Aug. 2002, to be TECO Nanotech Co., Ltd. Corp.

Additional Commentaries and remarks

Patents

Nano-Trend Technology Co, Ltd.

Benj — Mon, 30 Oct 2006 15:50:42 +0000

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Web url

http://www.nano-trend.com/

Contact Email

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Street address

1F., No.36, Lane 157, Sec. 1, Sinsheng S. Rd

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+886-2-27013067

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+886-2-27047694

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We supply high-end sensor/parts/controller/instrument/equipment to satisfy customer's requirement.

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Patents

Dynas International Corp

Benj — Mon, 28 Aug 2006 15:48:32 +0000

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Web url

http://www.niontech.com/

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Street address

2Fl., No.30, Rui-Guang Rd., Neihu Chui

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886-2-8792-8668

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886-2-8792-9908

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Dynas International Corp. was established in 2001 as the frontier of the nanotechnology. We have devoted ourselves to apply the Nion Technology, the leading technology in the nanotechnology field nowadays, to negative ionizer in terms of environmental and life protection. Currently, we mainly aim at developing a variety of products utilizing the Nion Technology to satisfy the needs from every category, such as anti-electromagnetic waves, antirust, isolation, preventing static electricity, and the process of compound metals.

Nion Technology is the technology which adeptly utilizing the PFT, the abbreviation of Polymer Fusion Technology, to compound different aggregation of nanometer size carbon element materials to become Fullerene, the high or super-high polymer materials with various kinds of attributes for our use. Nion Technology is moving forward to the extensive and delicate electrons and ions world, which is head and shoulder above the current nano technology research field and is the frontier in business nowadays. Nion Technology is the pearl on the crown of the nano technology, and could initiate the fourth industrial revolution.

We apply the technology of Polymer Fusion Technology and electric-catalyst to developing Nion Superconductor Ionizer, which is capable of producing over two million negative ions per c.c. within one second. The electric machine can release a considerable number of electrons, i.e. negative ions produced during the course of molecular resonance.

Dynas International Corp. will continue to explore and experiment the application of Nion Technology to different aspects, like the protection of environment, human health or other species. We will also keep up the continuous effort on the development of high-polymer, like high polymer batteries, etc. Besides the industrialism, our first priority is to contribute our power to make this world better, and take the responsibility as one of the members in the global village.

Additional Commentaries and remarks

Patents

Center for Responsible Nanotechnology (CRN), Chinese

Benj — Sat, 19 Aug 2006 23:14:41 +0000

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Web url

http://www.tainano.com/CCRN/

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Street address

Chinese 3F, No. 550, Chung Hsiao E. Rd. Sec. 5

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Long description In order to provide well-grounded and complete information, clear explanation, and workable proposals, CRN studies, clarifies, and researches the issues involvedpolitical, economic, military, humanitarian, and technological. CRN presents the results for both technical and popular audiences, and works to supply the information as effectively as possible. The purpose of CRN is to investigate the ethical, legal, and social implications (ELSI) of molecular manufacturing, and to educate those who will influence its use, or be affected by it.