Nanotechnology : San Jose

Certified Nanotech Clean Tech Professional

btran@ianano.org — Thu, 07 Aug 2008 23:08:32 +0100

Short description

The Certified Nanotech Clean Tech Professional Program includes lectures, group projects, discussions and lab practicals, covering nano-characterization and fabrication, nanobiotechnology, thin films and photovolatics, emerging clean technologies and EPA regulations of nanomaterials. Lab practicals include hands-on training with a Scanning Electron Microscope.

Long description

According to the U.S. government agencies, nanotechnology alone will be a trillion dollar business by the year 2015, and about 1 million employees will be required in U.S. alone. Clean technology, which has become a major application of nanotechnology, had a revenue growth from 55 billion in 2006 to 77.3 billion in 2007, a 40% annual increase. The time to enter this growing industry is now, and the CNCP certification program is designed to equip you with relevant knowledge and practical experience to be successful in the emerging industries.

The Certified Nanotechnology & Clean Technology Professional Program will be offered in a 8-week training from August 16- October 4, 2008 in San Jose.

The certificate program is designed to train the participants for professional jobs with an opportunity for advancement in the high growth industries of nanotechnology and clean technology. The certificate classroom/lab training courses will equip you to enter into the emerging nanotech and clean tech industries. Students will be expected to demonstrate their acquired knowledge through problem solving, group discussions, and project development.

In addition to classroom learning and group project research assignment, students are expected to participate in industry seminars which will be held on Thursdays at 11:30 AM - 1:30 PM and complete a hand-on learning coursework on how to use a Scanning Electron Microscope at our training laboratory.

Prerequisite: a 4 year degree (Bachelor of Art, Sciences or Engineering) or equivalent with at least 3 years of working experience.

Weekly schedule:
Saturday 9:00 AM- 5:30 PM (in classroom)
Tuesday and Thursday: 7:00 PM- 9:00 PM (online group project collaboration)
Thursday Industry Seminar: 11:30 AM- 1:30 PM (NanoLunch)

Course Schedule: http://cinano.com/cncp-8-week.html
Brochure: http://cinano.com/CNCP_8week_BROCHURE.pdf

REQUIREMENTS:

1. Candidates must have B.A or B.S. or BE degree or equivalent
2. Candidates must have at least three years of working experience.
3. Candidates must successfully complete an assessment test.

Event precise location and contact information

Location:
1290 Parkmoor Avenue
San Jose, CA 95126 USA
Tel. 408-280-6266
Fax. 408- 280-6255

Contact:
Alisha White
(408) 280-6266
info@cinano.com

Web site Url link

http://cinano.com/cncp.html

Web site Url text

Certified Nanotech Clean Tech Professional

NanoScale Material Stewardship Seminar

btran@ianano.org — Thu, 07 Aug 2008 20:22:25 +0100

Short description

Join the U.S. Environmental Protection Agency (USEPA) and the California Environmental Protection Agency (CALEPA) to discuss new initiatives and implement mutually beneficial standards for nanoparticles.

Long description

Join the International Association of Nanotechnology, the United States Environmental Protection Agency (USEPA) and the California Department of Toxic Substances Control (CDTSC) on Wednesday, August 13, to provide input on new initiatives and regulations underway concerning nanotechnology.

At the beginning of this year, the USEPA launched its Nanoscale Materials Stewardship Program to help provide a firmer scientific foundation for regulatory decisions by encouraging voluntary submission and development of information, including risk management practices for nanoscale materials. The stewardship program encourages participants – including manufacturers – to develop and report data on nanomaterials.

New State laws also provide a mechanism for state agencies to collaborate with chemical manufacturers to develop information such as analytical test methods, fate and transport in the environment, bioconcentration and other relevant information for chemicals manufactured or imported in the State. Under this new law, for instance, manufacturers may be required to provide information about chemical upon the request of that State, within a year of the request.

The State of California is also becoming involved with nanomaterials, including a new regulatory approach the Department of Toxic Substances Control is undertaking to compile relevant information on nanomaterials, as well as other chemicals. Chapter 699, Sections 57018-57020 became part of the Health and Safety Code in California in 2006. This new law provides a mechanism for state agencies to collaborate with chemical manufacturers to develop information such as analytical test methods, fate and transport in the environment, bioconcentration and other relevant information for chemicals manufactured or imported in the State. Included in the law is the requirement that manufacturers shall provide specified information about chemicals of concern within a year of the Department's request."

Jim Alwood, from USEPA’s Chemical Control Division in Washington, D.C., will discuss his agency’s nanotechnology program, including an overview of the Toxic Substances Control Act and the Nanoscale Materials Stewardship Program. Dr. Jeff Wong, Chief Scientist for the DTSC, will highlight the main provisions of the new state law and how the Department and the nano industry can work together in implementing it.

Take advantage of this unique opportunity to network and dialogue with industry partners, government representatives and manufacturers as these new rules and regulations are put into place!

Who Should Attend:

1. Representatives from companies that manufacture, import, process, or use nanoscale materials for commercial purposes, including those who:

* Manufacture or import engineered nanoscale materials;
* Physically or chemically modify or process an engineered nanoscale material;
* Physically or chemically modify or process a non-nanoscale material to create an engineered nanoscale material; or
* Use engineered nanoscale materials in the manufacture of a product.

2. Researchers who develop or study engineered nanoscale materials.

3. Business professionals interested in public policy and potential standards related to nanotechnology.

Speakers:

Jim Alwood
Program Manager, Chemical Control Division
U.S. Environmental Protection Agency

Jeff Wong
Chief Scientist, Department of Toxic Substances Control
California Environmental Protection Agency

Registration Fee $95
(includes conference materials and light lunch)
http://cinano.com/registration-NanoStewardship.htm

Event precise location and contact information

Location:
International Association of Nanotechnology HQ
1290 Parkmoor Ave
San Jose, CA 95126

Contact:
Brian Tran
(408) 280- 6222
btran@ianano.org

Web site Url link

http://www.ianano.org/NanoStewardship.htm

Web site Url text

NanoScale Materials Stewardship Seminar

Bookham

NanoStaff — Wed, 19 Mar 2008 15:30:09 +0000

Ticker Id

Web url

http://www.bookham.com/

Contact Email

sales@bookham.com

Short description

Street address

2584 Junction Ave.

Zip or postal code

95134

Telephone

+1 408 383 1400

Fax

+1 408 919 6083

Foundation date

Ceo, president

Number of employees

Long description

Bookham, Inc. is a leading developer, manufacturer, and provider of optical solutions. The company designs, manufactures and markets optical components, modules and subsystems used in a broad range of markets, including telecommunications, data communications, aerospace, industrial, consumer optics, semiconductor, sensing, scientific and defense.

Founded in 1988, the company is based in San Jose, California and has development and manufacturing facilities in the UK, USA, Canada, China, and Switzerland.

Bookham boasts two facilities in the United Kingdom, two in the United States, one in Canada, and a 250,000 square foot, state-of-the-art manufacturing facility in Shenzhen, China.

Additional Commentaries and remarks

Patents

Tynax - the technology trading exchange

NanoStaff — Tue, 18 Mar 2008 18:24:46 +0000

Ticker Id

Web url

http://www.tynax.com/ttx1/default.asp

Contact Email

Short description

Street address

111 West Saint John Street, Suite 200,SDForum Entrance

Zip or postal code

95113

Telephone

Fax

Foundation date

Ceo, president

Number of employees

Long description

Tynax is a global technology trading exchange that brokers a range of technology-related transactions including patents sales, patent acquisitions, divestments, technology transfers, IP-backed financings, licenses and strategic partnerships.
Headquartered in Silicon Valley, California, Tynax operates through its technology exchange website, an in-house team of technology and deal-making specialists and a global network of brokers. Tynax offers tailored, confidential services to 'stealth-mode' clients looking to complete technology transactions without alerting competitors to their plans and activities.

Additional Commentaries and remarks

Patents

Clarke Clean

mark karakas — Mon, 25 Feb 2008 00:02:41 +0000

Ticker Id

Web url

www.clarkeclean.com

Contact Email

mark@clarkeclean.com

Short description

Street address

1326 Avalone Dr.

Zip or postal code

95124

Telephone

408.892.9972

Fax

Foundation date

Ceo, president

Cliff Clarke

Number of employees

Long description

Clarke Clean is dedicated to providing solutions for the cleaning needs of our world and future generations.Our goal is to make measurable and sustainable contributions to the environment by pioneering the use of innovative cleaning technologies. The use of nano coating in our solar panel cleaning process increses PV panel performance and decreases scheduled maintenance intervals.

Additional Commentaries and remarks

Patents

SPIE Advanced Lithography is the industry's most important technical event.

JohnT — Tue, 08 Jan 2008 09:19:55 +0000

Short description

SPIE Exhibitions provide marketing and sales opportunities to reach your audience. Exhibit with SPIE—we'll help you move your technology to market.

Long description

SPIE Exhibitions provide marketing and sales opportunities to reach your audience. Exhibit with SPIE—we'll help you move your technology to market.

* Reach prequalified buyers
* Establish alliances with vendors
* Learn about your industry's future
* Build product and brand awareness
* Differentiate your offerings
* Test market new products
* Stay ahead of your competition

Event precise location and contact information

http://spie.org/advanced-lithography-exhibition.xml

San Jose Convention Center
San Jose, California, USA

spiesales@spie.org

Web site Url link

Web site Url text

KLA-tencor

vinay1210 — Thu, 27 Dec 2007 12:17:47 +0000

Ticker Id

Web url

http://www.kla-tencor.com

Contact Email

info@kla-tencor.com

Short description

Street address

160 Rio Robles

Zip or postal code

95134

Telephone

+1-408-875-3000

Fax

+1-408-875-4144

Foundation date

Ceo, president

Number of employees

Long description

KLA-Tencor Corporation is the world's leading supplier of process control and yield management solutions for the semiconductor and related microelectronics industries. The company's comprehensive portfolio of products, software, analysis, services and expertise is designed to help IC manufacturers manage yield throughout the entire wafer fabrication process-from R&D to final yield analysis. Since yield improvements are key to increasing manufacturing productivity and profitability, the yield management market that KLA-Tencor leads has outperformed the semiconductor capital equipment market segment as a whole.

Ranked among the world's top ten semiconductor equipment manufacturers, KLA-Tencor offers a broad spectrum of products and services that are used by every major semiconductor manufacturer in the world. These customers turn to KLA-Tencor for in-line wafer defect monitoring; reticle and photomask defect inspection; CD SEM metrology; wafer overlay; film and surface measurement; and overall yield and fab-wide data analysis. These advanced products, coupled with the company's unique yield management consulting practice, allow KLA-Tencor to deliver the complete yield management solutions customers need to accelerate their yield learning rates, reduce their yield excursion risks and adopt industry-leading yield management practices.

Competing in rapidly expanding markets where its leading-edge technology and comprehensive solutions provide a significant competitive edge, KLA-Tencor's primary market remains the semiconductor industry. In recent years, the company has also increased its focus on the rapidly growing data storage industry.

To support its growing, global customer base, KLA-Tencor maintains a significant presence throughout the United States, Europe and Asia, with local sales and applications engineers, customer and field service engineers and yield management consultants. The company counts among its top customers leading semiconductor manufacturers from each of these regions, and derived approximately 70 percent of its 1997 revenues from outside the U.S.

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Corporate History

KLA-Tencor was formed in May 1997 through the merger of KLA Instruments and Tencor Instruments, two long-time leaders in the semiconductor equipment industry, each with over 20 years of experience. With combined revenues of nearly $1.5 billion and a global workforce of over 5,300, KLA-Tencor offers a breadth and depth of process control and yield management solutions unmatched in the industry.

Founded in 1976 and credited with pioneering the yield management market, KLA started its inspection legacy in 1978 with an automated inspection system that reduced photomask inspection time from eight hours to 15 minutes. The company went public in 1980 and shortly thereafter, broadened its inspection product portfolio to include wafer inspection. Two years later, the company expanded into the wafer metrology business with optical overlay and linewidth measurement systems. KLA continued to broaden its product line, developing software products to integrate inspection and measurement data for analysis, and ultimately forming the industry's first yield management group to provide customers with expertise in yield enhancement through engineering consulting services. At the time of the merger with Tencor, KLA had revenues of approximately $695 million and 2,500 employees worldwide.

Tencor was also founded in 1976, and introduced its first product, the Alpha-Step stylus surface profiler, just seven months later. The Alpha-Step provided a significant improvement in step height measurement, a critical parameter in measuring film layer thickness. In 1984, the company launched its first Surfscan product, a particle and contamination detection system based on laser scanning technology that soon became a production standard. In the 1990s, Tencor expanded its product mix to include defect review and data analysis tools. Following an initial public offering in 1993, Tencor acquired Prometrix, a leading supplier of thin-film measurement tools, further expanding its product portfolio. At the time of the merger with KLA, Tencor had revenues of approximately $403 million and 1,400 employees around the world.

KLA-Tencor is headquartered in San Jose, California, with sales and support facilities around the world. It is traded on the Nasdaq National Market under the symbol KLAC. The company was selected by Standard and Poors to be part of the S&P500 Index in September 1997. In 2005, Forbes Magazine named KLA-Tencor one of the Best Managed Companies in America in its annual list of America’s Best Big Companies. KLA-Tencor was one of only four high-technology companies, as well as the only company in the semiconductor industry, to be honored with this accolade for that year.

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The Critical Need for Yield Management and Process Control Solutions

Several factors inherent in the semiconductor industry drive the critical need for comprehensive yield management and process control solutions. Among the most significant of these are: increasing device complexity; shrinking geometries; reduced product life cycles; and increased competition.

To meet the needs of the dynamic markets it supplies, the semiconductor industry is constantly increasing the functions incorporated into a single device, while simultaneously reducing device size. Today, leading-edge products have design rules that are 0.25 micron or smaller, hence a single device may combine the functions provided by as many as five or more separate devices in previous product generations.

At the same time, intense competition in the computing, electronics and communications industries shorten product life cycles, which has a corresponding effect on the semiconductor industry. While ten years ago, a semiconductor product life cycle, from design to production, could span several years, today, six months or less is the norm.

These challenges are further complicated by intense competition within the semiconductor industry, which drives an expectation for declining prices despite increasing product complexity. Thus, IC manufacturers simultaneously face continuing pressure on profitability, shorter product cycles and increasing manufacturing complexities.

Additional Commentaries and remarks

Patents

SPIE Advanced Lithography 2008

Sat, 15 Sep 2007 23:52:10 +0100

Short description

Participate in the most important technical event in the semiconductor lithography industry.

Long description

The SPIE Advanced Lithography Symposium is the premier annual international forum bringing practitioners of micro- and nanolithography together in a stimulating, informative, and interactive environment. The Symposium is fully committed to support your interests whether you work in semiconductor production lines, pilot lines, or research laboratories. It succeeds because the programs are tailored to professionals developing and using cutting-edge technologies and techniques. Also, the numerous short courses offered taught by individuals who are active in the field and recognized for their theoretical knowledge and practical experience.

Event precise location and contact information

Web site Url link

http://spie.org/advanced-lithography.xml?WT.mc_id=RCALENDARW

Web site Url text

http://spie.org/advanced-lithography.xml?WT.mc_id=RCALENDARW

MOEMS-MEMS 2008 – Part of SPIE Photonics West

Sat, 15 Sep 2007 23:47:07 +0100

Short description

Long description

Micro- and nanofabricated electromechanical and optical components, created by batch processing, provide the missing links to the mass-produced miniaturized products and systems of the future, superior in cost, performance, and reliability. Be a part of this evolution by presenting your research in this international premier symposium.
Each year we also commit one of our conferences to illuminate an emerging area of interest. Following up the success of last year's conference on the Micro-Nano Interface, this year's focus will be on Transducers at the Micro-Nano Interface.
Awards for Best Papers will be presented for each conference and for the overall Symposium. The most outstanding papers from each conference of the Symposium will be recommended for submission to the Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3), SPIE's refereed and archival journal of progress in the science and technology of lithographic, fabrication, packaging, and integration technologies for electronics, photonics, MOEMS, and MEMS.
Our 2008 symposium will feature exciting joint sessions among our conferences and other Photonics West symposia, facilitating interaction of a larger and diversified group of attendees and participants. Our symposium will kick off, as always, with outstanding plenary speakers covering cross-cutting and synergistic topics, while our individual technical conferences will stimulate audiences on more focused topics with excellent keynote speakers, invited papers, and exciting panel discussions. Many selected short courses will complement the conference technical sessions. As a participant, you will have the opportunity to meet innovative people, undertake new initiatives, invigorate your thinking, and motivate yourself towards your goals and objectives.

Event precise location and contact information

Web site Url link

http://spie.org/moems-mems.xml?WT.mc_id=RCALENDARW

Web site Url text

http://spie.org/moems-mems.xml?WT.mc_id=RCALENDARW

SPIE Photonics West 2008

Sat, 15 Sep 2007 23:43:43 +0100

Short description

Photonics West includes the entire spectrum of light-driven technologies and attracts researchers and product developers from around the world.

Long description

Photonics West includes the entire spectrum of light-driven technologies and attracts researchers and product developers from around the world. Four renowned symposia, 3,000 R&D presentations, and two robust exhibitions connect the brightest minds with leaders in science and technology.
+ BIOS 2008
+ LASE 2008
+ MOEMS-MEMS 2008
+ OPTO 2008
Register for the opportunity to:
+ Collaborate with colleagues across diverse fields and disciplines
+ Add value to your own research efforts
+ Get up to date on the latest developments in your field

Event precise location and contact information

Web site Url link

http://spie.org/photonics-west.xml?WT.mc_id=RCALENDARW

Web site Url text

http://spie.org/photonics-west.xml?WT.mc_id=RCALENDARW

Today’s Scanning Probe Microscopy (SPM) in Nanotechnology, An introduction for advanced applications of SPM

Benj — Fri, 27 Jul 2007 11:17:43 +0100

Short description

You Summer won't be complete without a visit to the frontier of nanotechnology visualization and measurement. Our next seminar will show you the world beyond AFM .

Long description

Date: Tuesday, August 21, 2007
Time: Registration & light lunch 11:30am. Presentation & Q/A 12:00 to 1pm

Alternate Place: SEMI World Headquarters 3081 Zanker Rd. San Jose, CA

Directions: Highway 101 to Montague Expressway East to Zanker Rd South; or Highway 880

to Montague Expressway West to Zanker Rd. South; Second Street entrance marked: LOBBY.

Cost: IEEE Members and Students $5. Non-Members $10

Please RSVP at our web site: www.ieee.org/nano

Talk Abstract:

Scanning Probe Microscope (SPM) has been a mainstream characterization tool in nanoscience and nanotechnology since it was invented in 1986. The unique combination of 3D atomic resolution, easy operation and less sample selectivity makes it more attractive over other conventional microscopes. Recently, a number of advanced applications beyond visualizing structures have been developed in response to the research demand in property and functionality study of nanoscale materials and devices. It is achieved by utilizing specific interaction forces between specimen atoms and a sharp probe. Electrical properties, thermal conductivity, mechanic force and chemical information could be revealed at the same ! time as image acquisition. Although machine vendors are facing more challenge in design of more reliable and faster scan mechanism, SPM is widely recognized as a powerful and affordable tool for seeing and measuring objects on the nanoscale..

Speaker Biography:

Allen Gu is Scanning Probe Microscopy Scientist at Pacific Nanotechnology Inc in Santa Clara, CA, an industrial leader in SPM business. He has 15 years’ experience in nanotechnology related research and development, including 7 years’ expertise in AFM applications. He conducts the majority of the applications and research work at PNI. Prior to PNI, he worked on nano material synthesis and nano devic! e fabrication at the Institute for Micromanufacturing, Louisiana Tech University, where he was a Fellow Researcher focused on projects for the NSF, Air Force, and DOE. Previously, he contributed to key national chemical projects for the Chinese government with a combined value of $200M. He authored numerous scientific journal publications.

He holds a Ph.D. in Nanosystems Engineering from Louisiana Tech University and B.S. in Chemical Engineering from Nanjing University, China.

Event precise location and contact information

SEMI World Headquarters 3081 Zanker Rd. San Jose, CA
Directions: Highway 101 to Montague Expressway East to Zanker Rd South; or Highway 880
to Montague Expressway West to Zanker Rd. South; Second Street entrance marked: LOBBY.

Web site Url link

Web site Url text

SVTC Technologies

Benj — Wed, 25 Jul 2007 10:39:25 +0100

Ticker Id

Web url

http://www.svtc.com/

Contact Email

Short description

Street address

3901 North First Street

Zip or postal code

95134

Telephone

408-240-7000

Fax

Foundation date

Ceo, president

Number of employees

Long description

Working in an IP-secure development foundry, SVTC customers have access to advanced process engineering experts for specialized materials, process or integration requirements, a Process Library with over 500 process recipes for over 50 tools, 8-inch processing tools that support the International Technology Roadmap for Semiconductors' (ITRS) 65nm roadmap, as well as the capability to integrate new materials and processes.

SVTC Services also include its FastXfer Commercialization Services that anticipate the challenges of transferring technology into a full-scale production environment. These services leverage the experience of SVTC process engineers to expedite time to revenue while managing rework and other associated costs. Customers may choose their own manufacturing partners or leverage SVTC's Foundry Partner relationships.

Additional Commentaries and remarks

Patents

VESTA Technology, Inc.

Benj — Thu, 12 Jul 2007 10:56:39 +0100

Ticker Id

Web url

http://www.vestatechnology.com/

Contact Email

info@vestatechnology.com

Short description

Street address

3003 N. First Street

Zip or postal code

95134

Telephone

408 - 519 - 5800

Fax

408 - 519 - 5803

Foundation date

Ceo, president

Number of employees

Long description

VESTA offers leading edge solutions for advanced thin-film deposition, ferroelectric materials and dry etch technologies utilizing Atomic Layer Deposition (ALD), Metal ALD/CVD, and Plasma Enhanced Dry Etching. As a core ALD technology company, VESTA innovates and commercializes the processing and manufacturing technologies that helps semiconductor companies produce the world's most advanced devices with competitive capabilities and manufacturing processes uniquely tailored for their needs.

Additional Commentaries and remarks

Patents

Novellus Systems, Inc.

Benj — Thu, 15 Mar 2007 11:22:33 +0000

Ticker Id

Web url

http://www.novellus.com/

Contact Email

info@novellus.com

Short description

Street address

4000 North First Street

Zip or postal code

95134

Telephone

(408) 943-9700

Fax

Foundation date

Ceo, president

Number of employees

Long description

The company’s legacy CVD, PVD, and ECD products are used to deposit extremely thin films of insulating and conductive materials that are used to create the wiring on a chip. Other Novellus products are used to clean the surface of the chip in-between manufacturing steps (surface preparation), to polish the surface of the device to ensure a flat (planar) surface (CMP), or to post-treat deposited films in order to improve mechanical properties (UVTP). As circuit geometries decrease in size, the deposition, surface preparation, CMP, and film treatment systems manufactured by Novellus become increasingly critical technologies for manufacturing advanced semiconductor devices.

Additional Commentaries and remarks

Patents

Nanotechnology commercial trends and forecast for success

Benj — Sun, 19 Nov 2006 18:16:08 +0000

Short description

Nanotech is evolving from discovery to commercialization, and leading corporations and startups in fields like materials and manufacturing, life sciences, electronics, and instrumentation are feeling the impact. This is driving big changes in science-centric business areas like research and product development. Nanotech’s commercial success is now even hitting more mundane functions like partnering and hiring, as the number of people working on nanotech in large corporations will increase sixfold in the next three years. The talk will describe these trends with facts from today and forecasts for tomorrow.

Long description

Speaker Biography:
Mark Bunger joined Lux Research with 14 years of business strategy experience, both as a management consultant and technology analyst. Most recently, he was a Principal Analyst at Forrester Research, where he studied and advised clients in manufacturing industries. The first years of Mark's career were spent at Accenture in the U.S., U.K., and Scandinavia, where he was a consultant focusing on a variety of industries and technologies. Mark’s work can be found on CNN, CNBC, The Wall Street Journal, and the Financial Times.
Mark's education includes International Marketing at Märdalen Polytechnic in Sweden, and Market Research at the University of Texas. In addition, Mark studied biochemistry through the University of California at Berkeley's extension program, and currently assists part-time in a neural stem cell lab in the UCSF Department of Neurology.

Event precise location and contact information

Time: Registration & light lunch 11:30am. Presentation & Q/A 12:00 to 1pm
Place: SEMI World Headquarters 3081 Zanker Rd. San Jose, CA
Cost: Members and Students $5. Non-Members $10
RSVP: dhavaljb@aol.com Web link: www.ieee.org/nano

Web site Url link

http://www.ieee.org/nano

Web site Url text

Ieee

Nanotech: Imagine the Possibilities! 2006

Benj — Thu, 26 Oct 2006 14:41:27 +0100

Short description

Second Annual Symposium Showcasing University Graduate Research.

Long description

Novel features of this Symposium include:
Pre-publication briefs of university graduate research topics in nanotechnology.
Challenge to the attendees to contribute imagined potential applications and opportunities that may transcend the present scope of the presented work.
Ample opportunity for networking with the graduates and other attendees.

Graduate research topics to be presented include:
Aligned carbon nanotubes filter for gas and water purification.
Nanoscale cell injection systems.
Prediction of nanocomposite properties using an AFM.
Pulsed LASER deposition of nano ferroelectric & ferromagnetic films.
Nanostructured templates for improved PV organic semiconductors.
Synthesis of Silver nanoparticles with less than 3nm diameters.
Carbon nanotube microelectrode arrays.
Tissue engineering enabled by functionalized nanotubular bacterial virus.
Micro-reservoir Arrays for Chemical Delivery.

Registration:
Please register in advance to ensure there is plenty of lunch.
Online Registration: http://www.acteva.com/booking.cfm?bevaid=120032
or
RSVP by email to dhavaljb@aol.com
IEEE Members, students, unemployed: $15
Non IEEE Members: $25
At the door registration, cash or checks only, ADD $5

Event precise location and contact information

SEMI World Headquarters, 3081 Zanker Rd. San Jose, CA

Any questions: nickmassetti@ieee.org

Web site Url link

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IEEE: San Francisco bay area nanotechnology council

Benj — Fri, 01 Sep 2006 16:11:29 +0100

Ticker Id

Web url

http://ewh.ieee.org/r6/san_francisco/nntc/

Contact Email

Short description

Street address

50 Airport Parkway, Suite 111

Zip or postal code

95110

Telephone

408.561.1594

Fax

Foundation date

Ceo, president

Number of employees

Long description

Objectives

* Build bridges between local industry, academic, and government leaders, and encourage Bay Area involvement in the National Nanotechnology Initiative (NNI).

* Provide a resource for nanotechnology education.

* Provide nanotechnology venues for venture capitalists and new start-ups.

* Involve IEEE and other professional disciplines, and increase membership in all the professional societies.

* Provide focus on areas of nanotechnology which are of interest to IEEE, articulate a nano-matrix and define the core disciplines.

* Provide a resource for the media on nanotechnology in the Bay Area.

* Partner with the nanotechnology community on international conferences.

Additional Commentaries and remarks

Patents

NMassetti consulting

Benj — Thu, 31 Aug 2006 21:51:27 +0100

Ticker Id

Web url

http://www.nmassetticonsulting.com/

Contact Email

Short description

Street address

P.O. Box 8691

Zip or postal code

95155-8691

Telephone

(408)275-1871

Fax

Foundation date

Ceo, president

Number of employees

Long description

Provide technology assessment for VC due diligence of potential investments. Technology commercialization. Identify risks and preventitive measures. Development of Semiconductor device and fabrication processes. Design for manufacturability and yield improvement. Maturity assessment of foundation technologies for ICs and MEMS. NonVolatile memory, MRAM, BiCMOS, Analog, CMOS, Nanotechnology, 90nm.

Additional Commentaries and remarks

Patents

Silicon Genesis Corporation ( Sigen )

Benj — Tue, 29 Aug 2006 19:15:03 +0100

Ticker Id

Web url

http://www.sigen.com/

Contact Email

Short description

Street address

61 Daggett Drive

Zip or postal code

95134

Telephone

(408) 228-5858

Fax

(408) 228-5859

Foundation date

Ceo, president

Number of employees

Long description

The vision of SiGen is to become the leading provider of cost effective manufacturing solutions for advanced material substrates of exceptional specification for the microelectronic and photonic industries through the SiGen NanoTec™ suite of process technologies.

SiGen NanoTec™ is a premier suite of licenses that enables new innovations in NanoTechnology and takes advantage of SiGen’s layer-transfer and engineered wafer technologies as well as advanced process and equipment technologies. These licenses include NanoCleave™, NanoSmooth™, NanoBond™, and NanoStrain™.

SiGen’s signature NanoCleave™ process for thin film lamination and layer transfer is the foundation of SiGen’s technology portfolio. It was originally developed for SOI wafers, but is applicable to a wide range of products from ultra-thin SOI to advanced heterostructures such as Germanium-on-Insulator and multi-layered stacked SOI wafers. NanoSmooth™ is SiGen’s proprietary, patented non-contact wafer smoothing technology. It provides a fast and economical method of smoothing wafer surfaces to less than 1-Angstrom roughness. SiGen’s patented plasma-activated bonding process, NanoBond™, enables up to 30 times greater bond strengths than conventional wet bonding techniques. This process is applicable for a wide range of bonding and layer transfer processes including SOI, MEMS and other laminated structures.

The application of the SiGen NanoTec™ technologies reads into almost every new electronic and photonic device. A recent International Technology Roadmap for Semiconductors (ITRS) names wafer bonding and layer-transfer technologies as necessary new enabling capabilities for all future integrated device technology nodes. SiGen’s technologies can help fabricate next-generation thin-SOI, ultra-thin SOI, dual-gate, tri-gate, strained-silicon, strained-SOI, NanoPhotonic and 3D/heterogeneous devices.

Additional Commentaries and remarks

Patents

cDream Corporation

Benj — Thu, 24 Aug 2006 14:24:48 +0100

Ticker Id

Web url

http://www.cdreamdisplay.com/

Contact Email

Short description

Street address

6910 Santa Teresa Blvd. 2nd Floor

Zip or postal code

95119

Telephone

(408) 826-3216

Fax

(408) 363-6954

Foundation date

Ceo, president

Number of employees

Long description

cDream Corporation (cDream) is a fabless display company, founded to develop and design the next evolution of flat panel displays (FPDs) using our proprietary carbon-nano tube technology, replacing and superceding displays based on cathode ray tube (CRTs), thin film transistor liquid crystal (TFT-LCDs), plasma display panels (PDPs) and organic light emitting diodes (OLEDs). Engendered by todays need for mobility and the convergence of entertainment, multimedia and computing needs, both businesses and personal consumers are demanding display technology, which are lightweight, compact, high in picture quality and video response and power efficient.