Nanotechnology : B2B Software products

Material Studio Software

Benj — Thu, 28 Sep 2006 20:36:20 +0100

Short description

Price

Quantity for that price

Price currency

Long description

It dramatically enhances your ability to mine, analyze, present, and communicate data and information relating to chemicals and materials. Materials Studio's accurate prediction and representation of materials structure, properties, and inter-relationships provides valuable insight. Its tools solve key problems throughout the R&D process, capturing and helping you to share critical knowledge, often showing a marked return on investment.

Successes using Materials Studio have been reported in industries including chemicals, plastics, pharmaceuticals, paints, electronics, and aerospace. Visit the extensive case study library.

MS Modeling, Materials Studio's modeling and simulation product suite, operates under most Windows operating systems to XP. Integration with standard PC productivity tools facilitates communication of this data. A flexible client/server computing harnesses the power of your Windows®, Linux, UNIX, and HP Tru64 servers to access leading methods in computational chemistry and materials science, delivering results direct to your desktop.

Materials Visualizer, the core MS Modeling product, lets you easily create and study models of molecular or materials structure, exploiting stunning graphics capabilities to present your results. See the image gallery for yourself!

MS Matinformatics, Materials Studio's informatics product suite, uses state-of-the-art database technology and is supported on the Oracle® platform.

Product company name

Accelrys, Inc.

Product company Url

Patents

Additional Commentaries and remarks

NanoMaker

Benj — Thu, 28 Sep 2006 21:54:46 +0100

Short description

Price

Quantity for that price

Price currency

Long description

NanoMaker provides a unique set of possibilities for nanotechnologies
* It is supplied with friendly graphic editor to design hierarchical structures of any size and shape arranged to any level of complexity.
* Makes simulation of resist development.
* Calculates exposure dose values/times considering proximity effect correction for 2D/3D structures.
* Compensates static distortion of e-beam deflecting system.
* Significantly reduces total exposure time by actively suppressing dynamic delays of e-beam deflection.
* Can be used as diagnostic tool for creation of high-resolution panoramic view of large-scale (centimeters) micro objects.
Purposes:
1. To convert any scanning electron microscope (SEM) into an e-beam lithograph.
2. To provide an ultimate resolution of lithography with a certain setup (including industrial lithographs). To achieve this:
_a. make correction for proximity effect during data preparation for lithography
_b. compensate for the distortion and delays of scanning system during exposure and image acquisition
_c. compensate for the system drift at prolonged exposure

3. To predict results of lithography by simulating.
4. To ensure adjustment for various configurations of lithographic equipment, for the presence or absence of beam blanking systems, stages, etc.
5. To create three-dimensional structures in a resist.
6. To familiarize user with the basic principles of lithography.

Nanotechnology : B2B Software products

Material Studio Software

Short description

Price

Quantity for that price

Price currency

Long description

Product company name

Product company Url

Related company

Patents

Additional Commentaries and remarks

NanoMaker

Short description

Price

Quantity for that price

Price currency

Long description

Product company name

Product company Url

Related company

Patents

Additional Commentaries and remarks