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Plasma Dynamics, LLC

Submitted by kreismanis on March 7, 2008 - 19:32.
Category tags:
Address: 231 Andover Street
Zip: 01867

Visit this link

Phone : 978-988-2375

Fax : 978-988-0186

CEO/ President : Vilnis G. Kreismanis

Plasma Dynamics provides contract ICP RIE and plasma etching of semiconductors and advanced materials and ICP PECVD of silicon dioxide, silicon carbide, and silicon nitride. Plasma Dynamics also provides process development services, R&D, and custom manufacturing.

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