The Annual SPIE/BACUS Symposium is the premier worldwide technical conference and exhibition for the photomask industry.

The Annual SPIE/BACUS Symposium is the premier worldwide technical conference and exhibition for the photomask industry. This year's four-day symposium will give you the chance to engage with the most up-to-date research on emerging and on-going issues facing the photomask industry in advanced lithography and their manufacturing and data solutions. With the deep sub-wavelength era upon us, the industry's progress will depend on the successful integration and optimization of design, maskmaking, and wafer fabrication.
Help solve the most pressing issues in:
+ Mask Infrastructure
+ Mask Integration
+ Emerging Mask Technology
+ Mask Business

Monterey Marriott and Monterey Conference Center