These products are commercially available:

* BEAMETR is a technique for operator independent measurement of electron-beam size. The product includes fabricated nano-pattern and software. The operator scans the pattern; the software reads the image and automatically determines the beam size.
* CHARIOT: advanced Monte Carlo software to predict image formation in scanning electron microscopy (SEM) and e-beam defect inspection. It also predicts absorbed dose in EBL and other electron beam technologies.
* TRAVIT: software to simulate plasma etch and wet etch. This is the only software on dry etch in maskmaking; it can also be applied to wafer etch. The software simulates etch profile, CDs, and CD-variation for patterns and processes, including microloading effect.
* TEMPTATION (Temperature Simulation) software: temperature rise in electron beam lithography (EBL) and its influence on variation of critical dimensions (CD).
* GenISys data preparation and modeling software allows for fast layout viewing, access, and processing of layout data. It was designed for easy integration with inspection equipment and DFM software.
* XeDraw and XPG-2 (XENOS) pattern generators: Convert your SEM into a nanolithography tool! Get a speed of writing up to 50 MHz. The hardware comes with data preparation software and may include a beam blanker and a precision stage.