This deposition method enables the fabrication of highly structured thin films with engineerable features:
- thickness of the film: nano-meters to micro-meters;
- porosity: from solid to very low density;
- periodicity of the structures: from random to periodic;
- geometry of the structures, such as spiral, zig-zag, staircase, post or other, and
- choice of materials from a very large variety (mostly inorganic materials, such as metals, oxides, glass, etc.).