NanoInk, Inc.®, a global leader in nanotechnology, announced today that its NanoFabrication Systems Division will present a free workshop at the California NanoSystems Institute at UCLA on Friday June 18, 2010 from 10 a.m. through 3 p.m. The workshop, “Tip-Based Lithography for Bioengineers,” will highlight some of the most recent applications and protocols related to the controlled and multiplexed depositions of biomaterials, with applications in tissue engineering, cell research, and biosensor functionalization using NanoInk’s NLP 2000 System, a desktop nanolithography platform.
The workshop will feature technical talks and discussion from 10 a.m. to noon, lunch from noon to 1 p.m. and product demonstrations and discussion from 1 p.m. to 3 p.m. The workshop will take place in the CNSI Auditorium at the California NanoSystems Institute at UCLA, located at 570 Westwood Plaza, Building 114, in Los Angeles. To register, and for more information, please visit:http://events.constantcontact.com/register/event?oeidk=a07e2w8f88a6e0357fb
During the workshop, participants will have access to NanoInk’s NLP 2000 System, which is an easy to use and affordable desktop nanolithography platform in which patterns of nano to micron-sized features can be created with a wide variety of materials from metal nanoparticles to biomolecules. With the NLP 2000 System, researchers can rapidly design and create custom engineered surfaces over large areas, using the proven technique of Dip Pen Nanolithography® (DPN®).
More information about the workshop topics are as follows:
Biomaterials Deposition: Demonstrations will show how to directly pattern hydrogels, both pure and functionalized, in arbitrary sizes and patterns over large areas (40 mm x 40 mm). The NLP 2000 System gives researchers the ability to pattern multiple biocompatible polymers at sub-cellular features sizes with nanoscale precision.
Biosensor Functionalization: The NLP 2000 System can be used to write directly to existing structures, opening up the possibility to functionalize microscale sensor devices with multiple materials.
Parallel and Multiplexed Depositions: Using NanoInk’s multiple tip arrays; demonstrations will show how to pattern complex multi-component protein arrays with sub-cellular feature sizes for use in cell adhesion, cell migration, and cell differentiation studies.
Rapid Prototyping: The generation of new patterns requires a simple change in the pattern entered into the software. This direct write technique can be used to rapidly prototype arbitrary patterns without having to create a new master stamp or mask for each pattern.
Please visit www.nanoink.net or call (847) 679-8807 for more information on the NanoFabrication Systems Division, the NLP 2000 System, and related Application Notes.
NanoInk, Inc. is an emerging growth technology company specializing in nanometer-scale manufacturing and applications development for the life science and semiconductor industries. Using Dip Pen Nanolithography® (DPN®), a patented and proprietary nanofabrication technology, scientists are enabled to rapidly and easily create nanoscale structures from a wide variety of materials. This low cost, easy to use and scalable technique brings sophisticated nanofabrication to the laboratory desktop. Located in the new Illinois Science + Technology Park, north of Chicago, NanoInk currently has over 140 patents and applications filed worldwide and has licensing agreements with Northwestern University, Stanford University, University of Strathclyde, University of Liverpool, California Institute of Technology and the University of Illinois at Urbana-Champaign. For more information on products and services offered by NanoInk, Inc., see www.nanoink.net.
NanoInk, the NanoInk logo, Dip Pen Nanolithography and DPN are trademarks or registered trademarks of NanoInk, Inc.