First Nano, a division of CVD Equipment Corporation (Nasdaq: CVV) introduced today the EasyTube™ 101, a new Chemical Vapor Deposition research and development tool platform as part of the growing EasyTube™ family of products. This platform is designed to address the budget limitations and growing safety concerns for the university or industrial researcher at the forefront of technology in new processes for Nanotechnology and Energy related materials.
The EasyTube™ 101 platform is customer configured and can be upgraded or re-configured in the field for future process needs, thus enhancing its price/performance value. In the coming months, more process support information will be made available on our EasyTube™ product websites, thus providing increased support for our steadily growing worldwide EasyTube™ customer base.
Each EasyTube™ 101 system can be configured for a wide range of processes including ALD, APCVD, LPCVD, RTP, Annealing, Diffusion, etc. Most options and system reconfigurations can be added or installed in the field. The EasyTube 101 is controlled by our proprietary real-time LabWindow™ based process control software CVDWinPrC™ that provides recipe driven process control, real-time graphing and automatic data logging for optimal process reproducibility. It also communicates with a PLC to handle the hardware interface and provide appropriate, industrial level safety systems and includes a standard Web interface for remote training, software upgrades, system reconfiguration, support and trouble shooting.
For research size samples the EasyTube™ 101 platform provides most of the capabilities of the advanced EasyTube™ 2000 and EasyTube™ 3000 platforms. The basic EasyTube™ 101 is attractively priced and provides many built in industrial level safety and process capabilities that are typically only found on more expensive industrial platforms and are missing on home-made systems. Since research needs can change and budgets can limit the purchase of the more advanced systems, the EasyTube™ 101 is the optimal chemical vapor deposition research and development system that can be upgraded in the future as new or different process needs arise and additional funding becomes available.
About First Nano and CVD Equipment Corporation
CVD Equipment Corporation owns and operates three divisions: Together the CVD and First Nano product groups form the CVD/First Nano Division. The CVD product group designs and builds pilot and production Chemical Vapor Deposition processes for a multitude of applications and serves primarily the industrial and solar/energy markets. The First Nano product group manufactures the EasyTube equipment product line used by researchers around the world to develop and grow a wide variety of next generation Nanowire, Nanotube and Thin Film Materials. The CVD/First Nano Division also operates an Application Laboratory where it develops advanced processes and solutions to facilitate the commercialization of emerging technologies in solar/nano and green field. The Stainless Design Concepts Division manufactures Ultra High Purity (UHP) gas and chemical delivery systems for state-of-the-art Semiconductor fabrication, Solar, Energy and Research and offers complete gas and chemical delivery product lines. The Conceptronic Research International Division supplies reflow ovens and rework stations to the Printed Circuit Board assembly market and ball attach ovens to the back-end semi-conductor packaging industry. It also develops custom industrial inline oven based systems that process materials with controlled gas atmospheres and temperature profiles.
The Private Securities Litigation Reform Act of 1995 provides a “safe harbor” for forward-looking statements. Certain information included in this press release by CVD Equipment Corporation (CVD), as well as information included in oral or other written statements made or to be made by CVD, contains statements that are forward-looking. All statements other than statements of historical fact are hereby identified as “forward-looking statements,” as that term is defined in the Private Securities Litigation Reform Act of 1995. Such forward looking information involves a number of known and unknown risks and uncertainties that could cause actual results to differ materially from those discussed or anticipated by management. Potential risks and uncertainties include, among other factors, industry specific and general business conditions, competitive market conditions, success of CVD’s growth and sales strategies, possible customer changes in delivery schedules, cancellation of orders, delays in product shipments, delays in obtaining parts from suppliers, failure to satisfy customer acceptance requirements and other risk factors described in CVD’s SEC filings. All forward-looking statements are based on management’s estimates, projections and assumptions as of the date hereof and CVD assumes no obligation to update this press release.